Farrar, Nigel R.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - LPP EUV source readiness for NXE 3300B

Wood, Obert R., Panning, Eric M., Brandt, David C., Fomenkov, Igor V., Farrar, Nigel R., La Fontaine, Bruno, Myers, David W., Brown, Daniel J., Ershov, Alex I., Böwering, Norbert R., Riggs, Daniel J.,

Year:

2014

Language:

english

File:

PDF, 545 KB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Performance demonstration of significant availability improvement in lithography light sources using GLX control system

O'Brien, Kevin, Dunstan, Wayne J., Riggs, Daniel, Ratnam, Aravind, Jacques, Robert, Besaucele, Herve, Brown, Daniel, Zhang, Kevin, Farrar, Nigel

Year:

2008

Language:

english

File:

PDF, 368 KB

english, 2008

3

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Lithography light source challenges for double patterning and EUVL

Farrar, Nigel R., Lalovic, Ivan, Brandt, David, Brown, Daniel, Behringer, Uwe F. W.

Year:

2009

Language:

english

File:

PDF, 3.08 MB

english, 2009

4

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Effect of off-axis illumination on stepper overlay

Farrar, Nigel R., Bennett, Marylyn H.

Year:

1995

Language:

english

File:

PDF, 276 KB

english, 1995

5

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-μm geometries

Conley, Will, Babcock, Carl P., Lilygren, John A., Sandstrom, Clifford P., Farrar, Nigel R., Piatt, John, Kinkead, Devon A., Goodwin, William, Kishkovich, Oleg P., Higley, John K., Cate, Phil

Year:

1998

Language:

english

File:

PDF, 1.23 MB

english, 1998

6

Treatment of colitis with a commensal gut bacterium engineered to secrete human tgf-β1 under the control of dietary xylan

Zaed Z.R. Hamady, Nigel Scott, Mark D. Farrar, Meenu Wadhwa, Paula Dilger, Terence R. Whitehead, Robin Thorpe, Keith T. Holland, J. Peter A. Lodge, Simon R. Carding

Journal:

Inflammatory Bowel Diseases

Year:

2011

Language:

english

File:

PDF, 1.27 MB

english, 2011

7

Temporal Dynamics of Carbon Partitioning and Rhizodeposition in Wheat

Nigel B. Dilkes, David L. Jones and John Farrar

Journal:

PLANT PHYSIOLOGY

Year:

2004

Language:

english

File:

PDF, 1.58 MB

english, 2004

8

The Continuation of Moore's Law : Light Sources for Advanced Lithography

Daniel Brown, Nigel Farrar

Journal:

Laser Technik Journal

Year:

2009

Language:

english

File:

PDF, 374 KB

english, 2009

9

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Fabrication of 0.1-um T-shaped gates by phase-shifting optical lithography

Liu, Hua-Yu, Su, Chung-yi, Farrar, Nigel R., Gleason, Robert E., Cuthbert, John D.

Year:

1993

Language:

english

File:

PDF, 2.18 MB

english, 1993

10

Laser-Assisted TiSi2 Formation for ULSI Applications

Shamma, Nader, Talwar, Somit, Verma, Gaurav, Kramer, Karl-Josef, Farrar, Nigel, Chi, Chiu, Greene, Wayne, Weiner, Kurt

Journal:

MRS Proceedings

Year:

1997

Language:

english

File:

PDF, 1.72 MB

english, 1997

11

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling

Lalovic, Ivan, Kawahira, Hiroichi, Zurbrick, Larry S., Kritsun, Oleg, McGowan, Sarah, Bendik, Joseph, Smith, Mark, Farrar, Nigel

Year:

2008

Language:

english

File:

PDF, 595 KB

english, 2008

12

ECS Transactions [ECS China Semiconductor Technology International Conference 2011 (CSTIC 2011) - Shanghai, China (March 13 - March 14, 2011)] - Cymer LPP EUV Source System Development Status

Lin, Benjamin, La Fontaine, Bruno, Brandt, David, Farrar, Nigel

Year:

2011

Language:

english

File:

PDF, 251 KB

english, 2011

13

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging

Kroyan, Armen, Lalovic, Ivan, Farrar, Nigel R., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 162 KB

english, 2001

14

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra

Smith, Mark, Flagello, Donis G., Bendik, Joseph, Lalovic, Ivan, Farrar, Nigel, Howard, William, Sallee, Chris

Year:

2007

Language:

english

File:

PDF, 149 KB

english, 2007

15

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Modeling the effects of excimer laser bandwidths on lithographic performance

Kroyan, Armen, Bendik, Joseph J., Semprez, Olivier, Farrar, Nigel R., Rowan, Christopher G., Mack, Chris A., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 250 KB

english, 2000

16

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Integrated Circuit Metrology, Inspection, and Process Control VI - Performance of through-the-lens/off-axis laser alignment systems and alignment algorithms on Nikon wafer steppers

Farrar, Nigel R., Sporon-Fiedler, Frederik, Postek, Jr., Michael T.

Year:

1992

Language:

english

File:

PDF, 442 KB

english, 1992

17

Assessment of traditional and improved stove use on household air pollution and personal exposures in rural western Kenya

Yip, Fuyuen, Christensen, Bryan, Sircar, Kanta, Naeher, Luke, Bruce, Nigel, Pennise, David, Lozier, Matthew, Pilishvili, Tamara, Loo Farrar, Jennifer, Stanistreet, Debbi, Nyagol, Ronald, Muoki, Justus

Journal:

Environment International

Year:

2017

Language:

english

File:

PDF, 436 KB

english, 2017

18

Nucleotide Sequence of Ddp1, a High Copy Number Nuclear Plasmid of Dictyostelium discoideum

Nigel A. Farrar, Hidenori Kiyosawa, Joanne E. Hughes, Dennis L. Welker, Keith L. Williams

Journal:

Year:

1994

File:

PDF, 673 KB

1994

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Laser produced plasma light source development for HVM

Wood, Obert R., Panning, Eric M., Fomenkov, Igor V., Brandt, David C., Farrar, Nigel R., La Fontaine, Bruno, Myers, David W., Brown, Daniel J., Ershov, Alex I., Böwering, Norbert R., Riggs, Daniel J.,

Year:

2014

Language:

english

File:

PDF, 608 KB

english, 2014

20

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - High power LPP EUV source system development status

Lin, Benjamin Szu-Min, Chen, Alek C., Han, Woo-Sung, Brandt, David, Farrar, Nigel, Lin, Burn J., Yen, Anthony

Year:

2009

Language:

english

File:

PDF, 1.04 MB

english, 2009

21

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - In-situ measurement of lens aberrations

Farrar, Nigel R., Smith, Adlai H., Busath, Daniel R., Taitano, Dennis, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 2.92 MB

english, 2000

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Focus drilling for increased process latitude in high-NA immersion lithography

Lalovic, Ivan, Lee, Jason, Seong, Nakgeuon, Farrar, Nigel, Kupers, Michiel, van der Laan, Hans, van der Hoeff, Tom, Kohler, Carsten

Year:

2011

Language:

english

File:

PDF, 505 KB

english, 2011

23

Use of temperature sensors to determine exclusivity of improved stove use and associated household air pollution reductions in Kenya

Lozier, Matthew, Sircar, Kanta, Christensen, Bryan, Pillarisetti, Ajay, Pennise, David, Bruce, Nigel, Stanistreet, Debbi L., Naeher, Luke P., Pilishvili, Tamara, Farrar, Jennifer L., Sage, Michael, Ny

Journal:

Environmental Science & Technology

Year:

2016

Language:

english

File:

PDF, 854 KB

english, 2016

24

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - RELAX: resolution enhancement by laser-spectrum adjusted exposure

Lalovic, Ivan, Smith, Bruce W., Farrar, Nigel, Takahashi, Kazuhiro, Kent, Eric, Colon, Daniel, Rylov, German, Acheta, Alden, Toyoda, Koji, Levinson, Harry

Year:

2005

Language:

english

File:

PDF, 407 KB

english, 2005

25

Screening for antenatal psychological distress

King, Lydia, Pestell, Sarah, Farrar, Steph, North, Nigel, Brunt, Caroline

Journal:

British Journal of Midwifery

Year:

2012

Language:

english

File:

PDF, 583 KB

english, 2012

26

Advances in EUV light sources

Farrar, Nigel R., La Fontaine, Bruno M., Fomenkov, Igor V., Brandt, David C.

Journal:

Advanced Optical Technologies

Year:

2012

Language:

english

File:

PDF, 1.57 MB

english, 2012

27

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Fast and accurate laser bandwidth modeling of optical proximity effects

Lalovic, Ivan, Naber, Robert J., Kawahira, Hiroichi, Kritsun, Oleg, Bendik, Joeseph, Smith, Mark, Sallee, Chris, Farrar, Nigel

Year:

2007

Language:

english

File:

PDF, 312 KB

english, 2007

28

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Contribution of polychromatic illumination to optical proximity effects in the context of deep-UV lithography

Kroyan, Armen, Lalovic, Ivan, Farrar, Nigel R., Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 204 KB

english, 2002

29

Microstructure and mechanics of crazes in oriented polystyrene

Nigel R Farrar, Edward J Kramer

Journal:

Year:

1981

Language:

english

File:

PDF, 839 KB

english, 1981

30

Identification of KLHL41 Mutations Implicates BTB-Kelch-Mediated Ubiquitination as an Alternate Pathway to Myofibrillar Disruption in Nemaline Myopathy

Gupta, Vandana A., Ravenscroft, Gianina, Shaheen, Ranad, Todd, Emily J., Swanson, Lindsay C., Shiina, Masaaki, Ogata, Kazuhiro, Hsu, Cynthia, Clarke, Nigel F., Darras, Basil T., Farrar, Michelle A., H

Journal:

The American Journal of Human Genetics

Year:

2013

Language:

english

File:

PDF, 3.31 MB

english, 2013

31

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Resist Contrast Measurements Using A Development Rate Monitor

Farrar, Nigel R., Bowden, Murrae J.

Year:

1987

Language:

english

File:

PDF, 179 KB

english, 1987

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - 45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Yoshimochi, Kazuyuki, Tamura, Takao, Nagahara, Seiji, Uchiyama, Takayuki, Farrar, Nigel, Oga, Toshihiro, Bonafede, James

Year:

2008

Language:

english

File:

PDF, 409 KB

english, 2008

33

[IEEE 2007 Digest of papers Microprocesses and Nanotechnology - Kyoto, Japan (2007.11.5-2007.11.8)] 2007 Digest of papers Microprocesses and Nanotechnology - Development of a LPP EUV light source for below-32nm Node Lithography

Brandt, David, Oga, Toshihiro, Farrar, Nigel, Bonafede, James

Year:

2007

Language:

english

File:

PDF, 456 KB

english, 2007

34

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Photolithography process characterization and 3D simulation using track-mounted development rate monitor data

Dutta Chowdhury, Saraubh, Alexander, David W., Goldman, Mark, Kukas, Alan W., Farrar, Nigel R., Takemoto, Clifford H., Smith, Bruce W., Karklin, Linard, Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.09 MB

english, 1995

35

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Integrated Circuit Metrology, Inspection, and Process Control VIII - 0.35-micron DUV lithography for poly gate layer

Farrar, Nigel R., Singh, Bhanwar, Bennett, Marylyn H.

Year:

1994

Language:

english

File:

PDF, 513 KB

english, 1994

36

Can we do 0.15μm lithography with KrF?

Nigel Farrar, Will Conley, Hareen Gangala, Carl Babcock, Hua-Yu Liu

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 640 KB

english, 1999

37

NOTE

BASCH, LUCIEN, DE BROSSARD, M., MARSDEN, PETER, GILL, CRISPIN, DOLLEY, BRIAN H., MAY, W. E., DIXON, CONRAD, BREEN, KENNETH, SLEESWYK, ANDRÉ W., MACARTHUR, ANTONIA, FARRAR, AUSTIN, FAWCETT, NIGEL, MILL

Journal:

The Mariner's Mirror

Year:

1984

Language:

english

File:

PDF, 2.68 MB

english, 1984

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Laser-produced plasma light source for EUVL

Fomenkov, Igor V., Brandt, David C., Bykanov, Alexander N., Ershov, Alex I., Partlo, William N., Myers, Dave W., Böwering, Norbert R., Farrar, Nigel R., Vaschenko, Georgiy O., Khodykin, Oleh V., Hoffm

Year:

2009

Language:

english

File:

PDF, 967 KB

english, 2009

39

[ECS ISTC/CSTIC 2009 (CISTC) - Shanghai, China (March 19 - March 20, 2009)] ECS Transactions - EUV Source System Development for 22nm Generation and Beyond

Lin, Benjamin, Brandt, David, Farrar, Nigel

Year:

2009

Language:

english

File:

PDF, 1.42 MB

english, 2009

40

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging

Lalovic, Ivan, Kroyan, Armen, Zambon, Paolo, Silsby, Christopher D., Farrar, Nigel R., Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 109 KB

english, 2002

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond

Fomenkov, Igor V., Brandt, David C., Farrar, Nigel R., La Fontaine, Bruno, Böwering, Norbert R., Brown, Daniel J., Ershov, Alex I., Myers, David W., Naulleau, Patrick P.

Year:

2013

Language:

english

File:

PDF, 2.45 MB

english, 2013

42

EUV laser produced plasma source development

Nigel R. Farrar, David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Norbert R. Bowering, William N. Partlo, David W. Myers, Alexander N. Bykanov, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffm

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 405 KB

english, 2009

43

Nuclear plasmids in the simple eukaryotes Saccharomyces cerevisiae and Dictyostelium discoideum

Nigel A. Farrar, Keith L. Williams

Journal:

Trends in Genetics

Year:

1988

Language:

english

File:

PDF, 709 KB

english, 1988

44

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth

Lalovic, Ivan, Kroyan, Armen, Farrar, Nigel R., Taitano, Dennis, Zambon, Paolo, Smith, Adlai H., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 754 KB

english, 2001

45

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - The effect of polarized 193nm irradiation on photomask haze formation

Kim, Y. D., Smith, Bruce W., Kang, H. B., Zhang, Yuan, Tran, Chuong, Farrar, Nigel, Qin, Jennifer, Rockwell, Barry, Cho, H. J., Cottle, Rand, Chan, David, Martin, Pat, Choi, S. S., Progler, Chris

Year:

2005

Language:

english

File:

PDF, 38 KB

english, 2005

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - CO 2 /Sn LPP EUV sources for device development and HVM

Brandt, David C., Fomenkov, Igor V., Farrar, Nigel R., La Fontaine, Bruno, Myers, David W., Brown, Daniel J., Ershov, Alex I., Sandstrom, Richard L., Vaschenko, Georgiy O., Bowering, Norbert R., Das,

Year:

2013

Language:

english

File:

PDF, 997 KB

english, 2013

47

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists

Conley, Will, Babcock, Carl P., Farrar, Nigel R., Liu, Hua-Yu, Peterson, Bill, Taira, Kazuo

Year:

1998

Language:

english

File:

PDF, 2.54 MB

english, 1998

48

ECS Transactions [ECS China Semiconductor Technology International Conference 2010 (CSTIC 2010) - Shanghai, China (March 18 - March 19, 2010)] - HVM LPP EUV Source System Development Status

Lin, Benjamin, Brandt, David, Farrar, Nigel

Year:

2010

Language:

english

File:

PDF, 561 KB

english, 2010

49

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Effects of laser bandwidth on OPE in a modern lithography tool

Huggins, Kevin, Flagello, Donis G., Tsuyoshi, Toki, Ong, Meng, Rafac, Robert, Treadway, Christopher, Choudhary, Devashish, Kudo, Takehito, Hirukawa, Shigeru, Renwick, Stephen P., Farrar, Nigel R.

Year:

2006

Language:

english

File:

PDF, 199 KB

english, 2006

50

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

Almog, Eli, Caldwell, Roger F., Chang, Fang C., Chen, J. Fung, Farrar, Nigel R., Karklin, Linard, Laidig, Thomas L., Sabouri, Saeed, Shen, Wayne P., Staud, Wolfgang, Wu, Clive, Zelenko, Jeremy, Grenon

Year:

1998

Language:

english

File:

PDF, 1.66 MB

english, 1998

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